Tuam Tshoj Multi-Arc Ion Nyias Zaj Duab Xis Chaw tsim khoom Hoobkas

Product Overview

Muaj ntau yam -arc ion plating cov cuab yeej ua haujlwm rau kev siv cov txheej txheem nyuaj, cov yeeb yaj kiab ua haujlwm, thiab kho kom zoo nkauj PVD ua tiav ntawm cov khoom raug. Siv lub siab -tam sim no, qis-voltage nqus arc tawm, lub kaw lus ncaj qha vaporizes cov khoom siv hom phiaj (Ti, Cr, Al, Zr). Thaum ua ke nrog reactive gases (N2, O2, C2H2), nws synthesizes ntom hloov hlau nitrides, carbides, thiab oxides ncaj qha mus rau hlau substrates.

Ua los ntawm modular nqus chamber architecture, qhov kev daws teeb meem PVD no haum rau ntau qhov sib txawv ntawm cov nplais ntau lawm -los ntawm R&D batch processing mus rau automated, siab -throughput inline manufacturing. Lub kaw lus tau ua kom zoo rau kev siv lub hom phiaj siab thiab qis Tag Nrho Cov Tswv Cuab (TCO) nyob rau hauv tas li 24/7 kev lag luam ib puag ncig.

Multi-Arc Vacuum Deposition Equipment
Qhov no multi-arc nqus deposition system siv cathodic arc ion plating tshuab rau deposit ntom, siab -adhesion nyuaj coatings ntawm hlau thiab tsis yog-hlau substrates. Los ntawm kev tawm tsam qhov...
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Multi-Arc Ion Deposition System
The Multi-Arc Ion Deposition System performs industrial-scale cathodic arc evaporation for hard, wear-resistant, and low-friction thin films. The process achieves >80% ionization ntawm cov khoom...
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Multi-Arc PVD Cov Khoom Siv Ua Yeeb Yam
Lub Industrial Multi-Arc PVD System siv high-ionization cathodic arc lub cev vapor deposition rau deposit ntom, stoichiometric nyuaj coatings (xws li TiN, TiAlN, CrN, thiab DLC) mus rau metallic...
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Multi-Arc Ion Deposition Equipment
The Industrial Multi-Arc Ion Deposition System generates dense, high-adhesion thin films through high-current, low-voltage cathodic arc evaporation. Cov khoom siv lub hom phiaj (cathodes) yog...
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Multi-Arc Ion Thin Film System
Kev Lag Luam Multi-Arc Ion Thin Film System siv cathodic arc evaporation kom tso ntom ntom, siab -adhesion ceramic thiab metallic coatings rau hlau thiab alloy substrates. Los ntawm vaporizing cov...
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Multi-Arc Ion Thin Film Equipment
Qhov no multi-arc ion plating system siv cathodic arc evaporation rau deposit ntom, siab -adhesion nyuaj coatings thiab ua hauj lwm nyias films. Los ntawm kev tawm tsam qhov siab -tam sim no,...
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Technical Specifications

Parameter	Specification Range	Unit / Note
Chamber Dimensions	Ф600 x 600 rau Ф1500 x 1800	mm (Kev cai ntsug lossis kab rov tav configurations)
Qhov kawg nqus siab	<= 5.0 x 10^-4	Pa (Lub twj tso kua mis qhuav + Turbo-molecular / Roj diffusion teeb)
Cathode Arc Sources	4 mus rau 16 units	Electromagnetic steered los yog lim arc qhov chaw (FCA)
Substrate Bias Power	0-1000 Nws	V (Advanced Pulsed DC / MF bias peev xwm)
Kub kub	Chav ntsuas kub txog 600	C (PID tswj hluav taws xob cua sov)
Kev tsis sib haum xeeb	<= +/- 5%	Ntsuas los ntawm XRF hla thaj chaw ua haujlwm tau zoo
Tswj System	PLC + Industrial PC	Automated daim ntawv qhia ua tiav, SCADA cov ntaub ntawv nkag
Kev Nyab Xeeb & Kev Ua Raws Cai	CE, ISO 9001	UL-cov khoom siv hluav taws xob ua raws li kev thov

Multi-Arc Ion Deposition txheej txheem

Lub cev vapor deposition ib ntu ua haujlwm ntawm kev nruj, kaw -voj automated workflow kom paub meej batch-rau-batch repeatability:

Evacuation & Outgassing:

Lub tshuab nqus tsev vacuum yog pumped mus rau lub hauv paus siab ntawm<= 5.0 x 10^-3 Pa, while substrate temperatures are ramped to eliminate surface volatiles.

Plasma Etching (Bombardment):

Argon roj tau qhia. Kev tsis zoo siab tsis zoo yog siv rau lub substrate tuav, tsim Ar ions uas foob pob rau saum npoo kom tshem tawm cov neeg oxides thiab micro- cov kab mob.

Arc Evaporation & Ionization:

DC arc tam sim no ntaus cov khoom hlau cathode. Qhov chaw cathode hauv zos ncav cuag lub zog loj heev, tam sim ntawd vaporizing cov khoom siv rau hauv qhov siab -cov plasma ntom ntom ntom (ionization tus nqi> 80%).

Reactive Deposition:

Reactive gases raug txhaj rau hauv cov ntshav plasma ntawm cov kev tswj xyuas ib feem ntawm cov kev tswj hwm ntawm Mass Flow Controllers (MFCs), tsim cov stoichiometric compound films ntawm rotating substrates.

Cua txias & cua:

Kev tswj cov cua txias tshwm sim nyob rau hauv inert gas tiv thaiv ua ntej chamber venting, tiv thaiv cov oxidation ntawm freshly coated qhov chaw.

Cov khoom siv zaj duab xis & txheej txheej

Lub kaw lus txhawb nqa ntau-hlau cathode kev npaj, ua rau monolayer, multilayer, nano-composite, thiab gradient film architectures:

TiN (Titanium Nitride):

Txheem golden txheej; hardness 2200-2400 HV; Kev sib txhuam coefficient 0.4. Kev siv thawj zaug: cov cuab yeej txiav dav dav thiab cov khoom siv kho tshuab.

TiAlN (Titanium Aluminium Nitride):

Siab -kub oxidation tsis kam mus txog 850 C; hardness 3000-3300 HV. Kev siv thawj zaug: siab- ceev qhuav machining inserts thiab cav li qub.

CrN / CrAlN (Chromium Nitride):

Zoo heev corrosion kuj thiab tsis tshua muaj kev ntxhov siab sab hauv; tiv thaiv -kev qaug dab peg tiv thaiv tsis yog- ferrous hlau. Kev siv thawj zaug: tsim pwm, piston rings, thiab textile machinery Cheebtsam.

ZrN / TiCN:

Tsawg roughness (Ra<= 0.05 um); decorative stability and biocompatibility. Primary use: medical surgical instruments and premium sanitary hardware.

Daim ntawv thov

Cov cuab yeej txiav Precision:

Xaus mills, xyaum, hobs, thiab indexable inserts yuav tsum tau ncua lub neej cuab tam nyob rau hauv siab thermal loads.

Automotive Fais Fab:

Piston pins, tappets, roj txhaj tshuaj Cheebtsam, thiab iav nto yuav tsum tau txo ciam teb kev sib txhuam thiab scuffing kuj.

Moulds & Tuag:

Yas txhaj pwm, stamping tuag, thiab tuag-casting inserts yuav tsum tau tiv thaiv cov nplaum hnav thiab thermal qaug zog.

Aerospace Cheebtsam:

Turbine blades thiab titanium fasteners ua hauj lwm nyob rau hauv aggressive corrosive thiab siab - ib puag ncig kev nyuaj siab.

Customization & System Configuration

Standard catalog khoom tsis tshua haum rau lub Hoobkas layouts zoo kawg nkaus. Cov cuab yeej teeb tsa tau raug tsim los ntawm cov khoom tshwj xeeb geometry, lub sij hawm lub voj voog lub hom phiaj, thiab kev txwv qhov chaw:

Chamber Geometry:

Octagonal los yog cylindrical stainless hlau chambers (SUS304/SUS316L) featuring ob -cov dej phab ntsa- cov tsho txias.

Qhov Chaw Layout:

Side-mounted or bottom-driven arc sources with magnetic steering coils to minimize macroparticle generation and ensure high cathode utilization (>60%).

Substrate Fixturing:

Planetary rotation (3-}axis) los yog ib qho kev sib hloov mechanisms uas tau tsav los ntawm cov dej sib nqus feedthroughs los lav cov txheej txheej txheej ntawm complex 3D geometries.

Pumping Stack Options:

Cov hauv paus hniav tshuab, cov twj tso kua mis teb, cov twj tso kua mis cryogenic, lossis cov twj turbomolecular tau teeb tsa kom ua tau raws li lub twj tso kua mis nruj - lub sijhawm voj voog.

Kev Tswj Xyuas Zoo & Kev Ntsuas Cov Txheej Txheem

Txhua lub tshuab ua haujlwm nruj Factory Txais Kev Xeem (FAT) ua ntej xa khoom, sau tseg rau cov neeg yuav khoom tshuaj xyuas:

Vacuum Integrity Test:

Helium leak detection siv huab hwm coj spectrometry (txog tus nqi<= 1 x 10^-10 Pa*m3/s).

Kev nyab xeeb hluav taws xob & hlawv-hauv:

72-teev nruam qhuav khiav ntawm cov khoom siv hluav taws xob, dej txias sib cuam tshuam, thiab PLC automation logic.

Coating Verification (Nyob hauv-house Lab):

Cov qauv sau tau sim ntawm Calo-test (film thickness), Rockwell indentation (adhesion strength), thiab nanoindentation (hardness).

Installation, Commissioning & Technical Support

Cov txheej txheem npaj qhov chaw:

Cov duab kos duab qhia txog kev siv hluav taws xob tau muab rau cov dej txias ntws / siab, cua compressed, tso pa tawm, thiab cov khoom siv hluav taws xob busbar.

SAT & Kev Ua Haujlwm:

Ntawm -Kev teeb tsa ntawm qhov chaw (Site Acceptance Testing), lub tshuab nqus tsev calibration, thiab daim ntawv qhia hauv paus xa mus ua tiav los ntawm cov neeg ua haujlwm laus PVD txheej txheem.

Kev cob qhia txheej txheem:

Tes- ntawm kev cob qhia tus neeg teb xov tooj npog cov sij hawm hloov cathode, kev tiv thaiv lub tshuab nqus tsev, kev daws teeb meem, thiab kev ua kom zoo ntawm daim ntawv qhia yooj yim.

Kev them nyiaj yug Spare xeem:

Cov khoom siv tseem ceeb (cathodes, shields, insulators, thiab seals) stocked rau thoob ntiaj teb xa hauv 48 teev.

Cov lus nug nquag

Q: Koj ua li cas thiaj li txwv cov macroparticles (droplets) uas muaj nyob rau hauv ntau -arc ion plating?

A: Peb siv cov khoom siv sib nqus sib nqus ua ke nrog kev ua kom zoo tshaj plaws arc tam sim no waveforms stabilize cathode me ntsis thiab txo qis emissions. Rau ultra-kev siv kho qhov muag los yog kev kho mob, lub kaw lus tuaj yeem ua ke nrog Filtered Cathodic Arc (FCA) qhov chaw.

Q: Dab tsi yog lub sijhawm hloov pauv rau kev cai chamber configuration?

A: Standard configurations nkoj nyob rau hauv 16 mus rau 20 lub lis piam. Qhov loj me ntawm lub chamber, automated robotic loading interfaces, los yog cov twj tso kua mis tshwj xeeb yuav tsum tau 24 mus rau 30 lub lis piam los ntawm P&ID daim duab pom zoo.

Q: Lub kaw lus puas tuaj yeem khaws ntau cov txheej txheem rau cov tsev neeg sib txawv?

A: Yog. PLC tswj kev lag luam muaj txog li 100 tus txheej txheem zaub mov txawv. Qhov no ua rau automated, ib qho - kov kev ua tiav ntawm cov khoom siv hluav taws xob loj (MFCs), kev tsis sib haum xeeb voltage ramping, arc tam sim no sequencing, thiab cov sij hawm tshwj xeeb.

Peb paub zoo-paub tias yog ib qho ntawm cov ua ntau-arc ion nyias zaj duab xis cov khoom lag luam thiab cov muag khoom hauv Suav teb. Yog hais tias koj yuav mus yuav customized multi- arc ion nyias zaj duab xis khoom ua nyob rau hauv Tuam Tshoj, txais tos kom tau txais pricelist los ntawm peb lub hoobkas. Rau nqe kev sab laj, tiv tauj peb.