Multi-Arc Ion Deposition Equipment

Multi-Arc Ion Deposition Equipment

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The Industrial Multi-Arc Ion Deposition System generates dense, high-adhesion thin films through high-current, low-voltage cathodic arc evaporation. Cov khoom siv lub hom phiaj (cathodes) yog vaporized nyob rau hauv cov pa roj reactive (xws li N2, O2, los yog C2H2) los ua ke stoichiometric compound coatings. Engineered rau siab ionization tus nqi siab tshaj 80%, cov cuab yeej no yields exceptional zaj duab xis - mus rau - substrate bonding lub zog haum rau huab mechanical load ib puag ncig.
Kev faib tawm yam khoom
Multi-Arc Ion Thin Film Equipment
 
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The Industrial Multi-Arc Ion Deposition System generates dense, high-adhesion thin films through high-current, low-voltage cathodic arc evaporation. Cov khoom siv lub hom phiaj (cathodes) yog vaporized nyob rau hauv cov pa roj reactive (xws li N2, O2, los yog C2H2) los ua ke stoichiometric compound coatings. Engineered rau siab ionization tus nqi siab tshaj 80%, cov cuab yeej no yields exceptional zaj duab xis - mus rau - substrate bonding lub zog haum rau huab mechanical load ib puag ncig.

 

Technical Specifications

 

Parameter

Specification

Chamber Dimensions

Kev cai configurations ntawm Phi 800 x 1000 mm rau Phi 1500 x 2200 mm

Chamber Khoom

SUS304 / SUS316L Stainless Hlau, ob chav - phab ntsa dej - lub tsho txias

Qhov kawg nqus siab

<= 5.0 x 10^-4 Pa

Pump- Lub Sijhawm Ntsig

Atmosphere 6.0 x 10^-3 Pa in<= 15 minutes (clean, empty chamber)

Arc Power Supply

DC thiab pulsed arc fais fab units (0-200A adjustable, ripple<= 1%)

Bias Power Supply

Siab - zaus pulsed bias (-1000V rau 0V adjustable)

Evaporation Sources

4 mus rau 18 cathodic arc qhov chaw (filterable lossis standard magnetic steering)

Substrate Rotation

Planetary multi-axis rotation tsav los ntawm magnetic fluid feedthrough

 

Ntsiab nta


Magnetic Filtered Arc Technology:Integrated magnetic coils deflect macro-particles thiab droplets deb ntawm lub substrate kwj, ua ultra-tej droplet-dawb nto rau precision optics thiab tej cuab yeej.


Kaw-Loop Gas Flow Control:MKS huab hwm coj ntws tswj tswj cov roj reactive ib nrab siab nyob rau hauv +/- 0.1 sccm stability pib thaum lub sij hawm reactive deposition theem.


Substrate Temperature Management:Programmable radiant rhaub cov tsev txhab nyiaj ua ke nrog backside argon roj cua txias tswj substrate thermal pob nyiaj ntawm 150C thiab 600C.


Automated txheej txheem Recipes:PLC-raws li kev tswj vaj huam sib luag ua tiav ntau- cov txheej txheem tso tawm cov txheej txheem los ntawm kev ntxuav ion, gradient interlayer etching, mus rau lub davhlau ya nyob twg ua haujlwm txheej.

 

Nqus System Configuration


Roughing Pump:Cov hauv paus hniav blower thiab rotary vane txhua yam twj tso kua mis ua ke (Leybold / Edwards lub hauv paus).


High Vacuum Pump:High-throughput diffusion pumps or magnetically suspended turbomolecular pumps (>= 3200 L/s).


Kev ntsuas & Piping:Pneumatic stainless-steel nqus rooj vacuum li qub, pneumatic lub kaum ntse ntse li qub, thiab elastomer- kaw KF / ISO flanges leak- kuaj los ntawm helium huab hwm coj spectrometry (<= 1.0 x 10^-9 Pa*m^3/s).


Kev ntsuas siab:Ua ke Pirani thiab Cold Cathode ionization gauges muab lub sijhawm tiag tiag - tawm tswv yim thoob plaws huab cua mus rau ultra- lub tshuab nqus tsev siab.

 

Evaporation Materials & Substrate Compatibility


Cov ntaub ntawv hom phiaj:Titanium (Ti), Chromium (Cr), Aluminum-Titanium (AlTi), Zirconium (Zr), Copper (Cu), Stainless Steel, and custom alloy targets (purity >= 99.95%).


Cov khoom siv substrate:

  • Cemented Carbides (WC{0}}Co)
  • Siab -Speed ​​Steels (HSS)
  • Alloy hlau (SKD11, 316L, 4140)
  • Titanium Alloys (Ti-6Al-4V)
  • Engineering Ceramics thiab Kub-Resistant Superalloys

 

Daim ntawv thov


Txiav & tsim cov cuab yeej:Kev tso tawm ntawm TiAlN, AlCrN, thiab TiCN txheej rau ntawm qhov kawg mills, inserts, hobs, thiab stamping tuag kom nce qhov tawv tawv mus rau 3200 HV thiab tiv thaiv kev hnav.


Automotive Cheebtsam:Hard carbon (DLC) thiab CrN deposition ntawm piston rings, roj txhaj koob pins, thiab camshafts kom txo tau kev sib txhuam coefficients hauv qab no 0.1 nyob rau hauv qhuav khiav tej yam kev mob.


Medical Implants:TiN thiab ZrN biocompatible diffusion txheej ntawm cobalt -chromium thiab titanium hauv caug thiab lub duav pob qij txha, txo cov hlau ion leaching thiab hnav cov khoom khib nyiab.


Aerospace Hardware:Oxidation- tiv thaiv kab thaiv txheej rau turbine blades thiab fastener sib dhos ua haujlwm ntawm qhov ntsuas kub siab.

 

Kev kho kom haum


Chamber Geometry:Vertical pit-hom, kab rov tav pem hauv ntej- thauj khoom, lossis ob npaug- qhov rooj hla- los ntawm kev teeb tsa kom haum rau lub khw uas twb muaj lawm- txheej txheej hauv pem teb.


Kev koom ua ke Source:Hybrid configurations merging cathodic arc qhov chaw nrog unbalanced magnetron sputtering (Ums) cathodes nyob rau hauv ib chamber.


Jigging & Fixtures:Dedicated planetary los yog ob npaug - kev sib hloov cov cuab yeej tsim los ntawm CAD/FEM simulation rau cov khoom siv geometries (xws li, ntev extrusion tuag los yog complex surgical screws).

 

Quality Control & Manufacturing Ua raws cai


Quality Management Standards:Tsim, tsim, thiab sim ua raws li ISO 9001: 2015 kev tswj hwm zoo thiab ISO 14001 ib puag ncig kev tswj hwm.


Aerospace & Kev Kho Mob Traceability:Cov txheej txheem tswj hwm thiab cov ntaub ntawv raws tu qauv tau ua tiav nrog NADCAP AC7102 (Kev kho cua sov / Kev Txhim Kho Qhov Nto) raws li kev thov.


Leak Integrity:Txhua lub tshuab nqus tsev vacuum raug kuaj xyuas helium mass spectrometer ua ntej kev sib dhos kos npe -tawm.


Kev Nyab Xeeb Hluav Taws Xob:High -Kev ntsuas hluav taws xob tiv thaiv hluav taws xob thiab kev kuaj xyuas txuas ntxiv ua raws li CE / IEC cov qauv.


Khiav-off Test:72-teev qhuav tas li-khiav kev sim siab ntawm kev sib hloov tshuab, cov dej-txias ntws hloov, thiab PLC cuam tshuam cov tshuab.


Cov ntaub ntawv xa tuaj:Cov ntawv pov thawj ntawm cov khoom zeb kuaj (MTC), cov ntawv pov thawj ntawm lub tshuab nqus tsev vacuum, cov pob hluav taws xob schematic, thiab NIST-cov ntaub ntawv qhia txog kev ntsuas ntsuas ntsuas ntsuas.

 

Installation & Technical Support


Cov txheej txheem npaj qhov chaw:Comprehensive utility layout documentation covering cooling water flow rates (>= 30 m^3/h), ambient kub ranges, tso pa tawm, thiab hluav taws xob fais fab poob (3-theem, 380V/480V, 50/60Hz).


Kev Pabcuam Kev Ua Haujlwm:Ntawm -Qhov chaw kho tshuab qhov chaw, lub tshuab nqus tsev sib txuas, kev sib txuas hluav taws xob, thiab kev ua kom zoo ntawm daim ntawv qhia kev ua haujlwm tau ua los ntawm cov neeg ua haujlwm pabcuam hauv thaj chaw laus.


Kev cob qhia neeg ua haujlwm:5-hnub kev cob qhia nyob rau ntawm qhov chaw hais txog kev saib xyuas niaj hnub, kev daws teeb meem ntawm lub tshuab nqus tsev, lub hom phiaj hloov cov txheej txheem, thiab ntsuas qhov ntsuas rau cov qauv ua yeeb yaj kiab tshwj xeeb.


Cov Khoom Muag Khoom Muag:Cov khoom siv tseem ceeb (cathode insulators, qhov chaw tsaus ntuj, cov ntsaws ruaj ruaj, thiab cov khoom siv filament) tau khaws cia hauv cheeb tsam rau kev xa tawm hauv 48 teev.

 

FAQ

 

Q: Yuav ua li cas yog zaj duab xis thickness uniformity tswj nyob rau hauv complex 3D substrates?

A: Uniformity yog ua tiav los ntawm ntau yam -axis planetary rotation fixtures ua ke nrog computerized magnetic steering coils uas dynamically kho ion plasma ntom ntom faib thoob plaws substrate cheeb tsam, tswj thickness variation nyob rau hauv +/- 5%.

Q: Dab tsi tiv thaiv macro- cov tee dej los ntawm kev sib sau ntawm qhov chaw coated?

A: Macro-tej me me yog suppressed los ntawm filtered cathodic arc (FCA) technology siv curved magnetic duct filters uas cuab cov khoom particulates thaum cia ionized vapor mus txog lub substrate.

Q: Yuav tsum muaj kev siv hluav taws xob dab tsi ntawm -site?

A: Facilities require a closed-loop chilled water system (capacity >= 80 kW, inlet kub 18 mus rau 22C), compressed cua mov (0.6 mus rau 0.8 MPa rau pneumatic li qub), qhuav nitrogen purging kab, thiab mob siab rau cov hluav taws xob faib hluav taws xob sib piv cov kev cai load.

Q: Cov txheej txheem no puas tuaj yeem tso nyiaj ntau txheej lossis txheej txheej txheej?

A: Yog. PLC architecture tso cai rau ua kom muaj ntau yam khoom siv lub hom phiaj thiab tiag tiag - lub sij hawm hloov ntawm cov roj reactive ntws mus rau tso nano - cov txheej txheem txheej los yog kev ua haujlwm gradient interlayers.

 

Cim npe nrov: multi-arc ion deposition khoom, Tuam Tshoj multi-arc ion deposition khoom manufacturers, lwm tus neeg, Hoobkas

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