Muaj lub cev vapor deposition (PVD) platform engineered rau siab - tus nqi synthesis ntawm ntom, hnav-resistant, thiab ua hauj lwm nyuaj txheej. Kev txhawb nqa siab -tam sim no, qis-voltage cathodic arc tawm ntawm cov phiaj xwm khoom tsim tawm 80% mus rau ze-100% ionized plasma kwj.
Ua ke nrog cov programmable tsis zoo substrate biasing, lub zog kinetic siab no tsav atomic -scale interfacial mixing, yielding superior zaj duab xis adhesion thiab xoom columnar porosity. Lub chamber architecture txhawb modular multi-cathode configurations rau automated deposition ntawm ib zaug - txheej, multi- txheej nano- laminates, thiab stoichiometric gradient coatings (TiN, TiAlN, CrN, TiCN).
Technical Specifications
|
Parameter |
Engineering Specification |
|
Chamber Dimensions |
Customized cylindrical / duab plaub (Standard: Phi 800 mm x 1000 mm txog Phi 2000 mm) |
|
Chamber Structure |
Muab ob npaug rau-walled SUS304/316L stainless hlau nrog kev sib xyaw kauv cov dej txias |
|
Qhov kawg nqus siab |
<= 5.0 x 10^-4 Pa (Backed by magnetic levitation turbomolecular + roots-rotary pump stack) |
|
Pump -Down Cycle |
Atmosphere 6.0 x 10^-3 Pa in<= 15 minutes |
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Cathode Arc Sources |
4 mus rau 8 ywj siab DC channels (Phi 85 mm / Phi 100 mm dej-cov tuav lub hom phiaj txias) |
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Arc Fais fab tso zis |
0-200 A tsis tu ncua adjustable ib channel; integrated microsecond arc quenching |
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Substrate Bias Supply |
0-1000V adjustable, Pulsed DC tso zis (ntau zaus 10-50 kHz) |
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Substrate cua sov |
Quartz infrared teeb array; kev ua haujlwm qab nthab 600℃(+/- 5℃uniformity) |
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Fixture Motion |
Planetary los yog dual -axis rotation ntawm magnetic fluid rotary feedthroughs (0-5 RPM) |
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Tswj Architecture |
PLC + Industrial PC (IPC) ua haujlwm tiag tiag- lub sijhawm ua daim ntawv qhia ua tiav nrog kev sib cuam tshuam kev nyab xeeb |
Ntsiab nta
High ionization tus nqi:Direct cathodic vaporization converts metallic flux rau hauv siab -density ions, txhawb nqa cov qauv ntom ntom tsis muaj micro-voids.
Active Magnetic Steering:Programmable electromagnetic coils cheb qhov chaw arc hla lub hom phiaj lub ntsej muag, suppressing localized cratering thiab tsav lub hom phiaj siv cov khoom siv tshaj 60%.
Dynamic Gas Control:Kaw-loop Mass Flow Controllers (MFCs) tswj cov roj reactive txhaj tshuaj (N2, O2, C2H2) los ntawm lub sijhawm tiag tiag - lub sij hawm ib feem ntawm lub siab tawm tswv yim.
Multi-Source Synergy:Chamber phab ntsa haum rau hybrid lub hom phiaj layouts, cia uninterrupted sequential deposition ntawm multi-cov txheej txheem ceramic nyob rau hauv ib lub tshuab nqus tsev vacuum.
Nqus System Configuration
Roughing & Roots Pawg:Direct-tsav lub tshuab nqus tsev twj tso kua mis ua ke nrog lub siab-Txoj kev xaav hauv paus tshuab kom tswj tau cov pa roj ntau thaum ua haujlwm.
High Vacuum Stage:Magnetic levitation turbomolecular pump (>= 1600 L/s) ua ke ntawm lub siab -kev coj tus kheej pneumatic rooj vag valve.
Vacuum Instrumentation:Interlocked Pirani thiab Cold Cathode dual- ntsuas kev ntsuas ntsuas tag nrho cov siab nyob ntawm huab cua mus txog 10^-6 Pa.
Leak Integrity:Elastomer-flanges kaw nrog dej-jacketed cua txias tswj cov kab hluav taws xob hauv qab 1.0 x 10^-9 Pa*m3/s.
Evaporation Materials & Substrate Compatibility
Cathode Target Materials
Transition Hlau & Alloys:Titanium (Ti), Chromium (Cr), Zirconium (Zr), Aluminium (Al), Titanium{0}}Aluminium (TiAl 50/50, 33/67), Tungsten (W).
Tsis yog-Metallics:Siab -purity Graphite (C) rau Pob Zeb Diamond- Zoo li Carbon (DLC) thiab carbide txheej.
Industrial Substrates
Hlau & Carbides:High-Speed Steel (HSS), Cemented Carbides (WC-Co).
Structure Alloys:Austenitic/Martensitic Stainless Steels, Titanium Alloys (TC4), Nickel{1}}raws li Superalloys (Inconel).
Daim ntawv thov
Cov cuab yeej txiav Precision:Kev tso tawm ntawm TiAlN thiab AlTiN ntawm kev xyaum, qhov kawg mills, thiab iav hobs kom nce qhov tawv tawv mus rau 3300-3500 HV thiab nce thermal oxidation tsis kam mus txog 800 degree.
Automotive Engineering:Tsawg-kev sib txhuam, hnav- cov tshuaj tiv thaiv ntawm cov roj txhaj tshuaj, lub nplhaib piston, thiab cov kais dej.
Pwm thiab Tuag:Chromium nitride (CrN) tso rau ntawm cov yas txhaj tshuaj pwm los tiv thaiv cov nplaum hnav, micro- vuam, thiab resin sticking.
Customization Options
Chamber Loj:Geometric hloov kho kom haum rau cov vaj huam sib luag loj loj lossis siab -throughput me me carousels.
Qhov chaw Hybridization:Kev koom ua ke ntawm cathodic arc qhov chaw nrog unbalanced magnetron (UBM) sputtering lossis HiPIMS cathodes hauv ib lub cev sib koom ua ke.
Automation Interfaces:Factory MES kev koom ua ke ntawm OPC-UA raws tu qauv nrog rau cov kev xaiv automated loading hatch.
Kev Tswj Xyuas Zoo & Kev Xeem Lub Hoobkas
Helium Leak Verification:Mass spectrometer xau tshuaj xyuas ua tiav ntawm txhua qhov vuam thiab lub tshuab nqus tsev vacuum.
Hluav taws xob Safety Audit:Hipot rwb thaiv tsev soj ntsuam, grounding continuity checks, thiab E-stop circuit loop verification.
72-Hour Burn-In Test:Nruam qhuav-khiav caij tsheb kauj vab ntawm cov tshuab kev sib hloov, cov dej ntws hloov, thiab PLC valve ib ntus ua ntej disassembly.
Factory Txais Kev Xeem (FAT):Ua rau ntawm -qhov chaw kom paub tseeb tias cov qib nqus tsev vacuum, arc ignition stability, thiab lub hauv paus thickness tis ntawm calibration daim coupon.
Installation & Technical Support
Daim Ntawv Thov Kev Pab Cuam Tshuam:Detailed utility drawings specifying floor loading capacity, chilled water specifications (>= 0.3 MPa, 15-25 degree), tshem tawm cov pa tawm, thiab cov khoom siv hluav taws xob poob (3-theem, 380V / 480V).
Field Commissioning:Ntawm -Kev saib xyuas ntawm qhov chaw los ntawm cov kws kho tshuab thiab hluav taws xob engineering uas suav nrog kev sib tw, sib txuas, thiab kev sib tw ua haujlwm.
Kev cob qhia neeg ua haujlwm:Cov lus qhia tsim nyog ntawm kev teeb tsa software daim ntawv qhia, cathode phiaj pauv cov txheej txheem, thiab kev tiv thaiv lub tshuab nqus tsev.
Chaw Taws Teeb Diagnostics:Ruaj ntseg muaj VPN rooj vag kos nyob rau hauv lub tswj vaj huam sib luag rau software telemetry thiab pab daws teeb meem.
Cov lus nug nquag
Q: Yuav ua li cas lub kaw lus tswj microdroplets (macroparticles) muaj nyob rau hauv unfiltered cathodic arc txheej txheem?
A: Cov txheej txheem kev teeb tsa siv qhov ua kom zoo tshaj plaws electromagnetic steering teb los tswj arc qhov nrawm nrawm thiab txo qis qis emission. Rau cov khoom siv hluav taws xob lossis cov khoom siv kho qhov muag uas yuav tsum tau ua raws li -micron defect theem, Lim Cathodic Arc (FCA) magnetic ducting modules tuaj yeem ua ke los cuam tshuam cov macroparticles nruab nrab.
Q: Lub hom phiaj hloov pauv hloov lub sijhawm yog dab tsi?
A: Cathodes siv ceev -tso tawm cov tshuab clamping tsim. Tus neeg ua haujlwm tau txais kev cob qhia tuaj yeem ua tiav cov phiaj xwm hloov pauv tsis pub dhau 30 feeb yam tsis muaj kev sib tsoo ntawm cov khoom sib txuas.
Q: Lub kaw lus puas tuaj yeem ua haujlwm automated gradient multi- txheej khiav yam tsis muaj kev cuam tshuam tus neeg teb xov tooj?
A: Yog. PLC daim ntawv qhia cav tswj ntau- cov zaub mov theem, tswj kev hloov pauv hauv cov pa roj reactive ib nrab siab, substrate bias profileing, thiab lub zog sib txuas- channel ua kom tau txais.
Q: Dab tsi yog lub hauv paus ntsiab lus siv hluav taws xob ua ntej rau kev npaj qhov chaw?
A: The installation site must supply a closed-loop industrial chiller (15-30 kW cooling capacity), clean compressed air (>= 0.6 MPa), high-purity process gases (Ar, N2, C2H2 at >= 99.999% purity), thiab ruaj khov muaj 3-theem fais fab.
Cim npe nrov: Tuam Tshoj arc evaporation deposition khoom manufacturers, lwm tus neeg, Hoobkas
