Arc Evaporation Thin Film System

Arc Evaporation Thin Film System

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The Industrial Cathodic Arc Evaporation Thin Film System is engineered for the high-rate deposition of dense, strongly adherent metallic, alloy, and ceramic compound coatings. Kev khiav hauj lwm ntawm qhov qis-voltage, siab-tam sim no arc tawm ntawm cov khoom cathode lub hom phiaj, lub kaw lus vaporizes cov khoom ncaj qha mus rau hauv lub xeev siab ionized plasma (40% - 80% hlau ion piv). Qhov no ua rau muaj zog ions mus rau hauv lub substrate interface, ua kom zoo dua txheej adhesion piv rau cov txheej txheem thermal evaporation los yog cov qauv sputtering.
Kev faib tawm yam khoom
Arc Evaporation nyias zaj duab xis khoom
 
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Kev tsis

The Industrial Cathodic Arc Evaporation Thin Film System is engineered for the high-rate deposition of dense, strongly adherent metallic, alloy, and ceramic compound coatings. Kev khiav hauj lwm ntawm qhov qis-voltage, siab-tam sim no arc tawm ntawm cov khoom cathode lub hom phiaj, lub kaw lus vaporizes cov khoom ncaj qha mus rau hauv lub xeev siab ionized plasma (40% - 80% hlau ion piv). Qhov no ua rau muaj zog ions mus rau hauv lub substrate interface, ua kom zoo dua txheej adhesion piv rau cov txheej txheem thermal evaporation los yog cov qauv sputtering.


Ua rau thaj chaw tsim khoom thiab cov chaw tshawb fawb cov khoom siv siab heev, lub kaw lus tso tawm nyuaj, hnav -cov txheej txheem tribological resistant-xws li TiN, TiAlN, CrN, thiab AlCrN- mus rau cov cuab yeej txiav, tsim pwm, thiab cov khoom siv tshuab precision. Modular nqus chamber haum scalable multi-cathode configurations thiab automated 3-axis planetary rotation kom paub meej batch-to-batch repeatability.

 

Technical Specifications

 

Technical Parameter

Specification Range / Tus nqi

Qhov kawg nqus siab

<= 5.0 x 10^-4 Pa (achieved via turbomolecular and rotary/dry backing pump combination)

Chamber Dimensions

Customized puab txoj kab uas hla (Standard industrial qauv: dia. 600 hli rau dia. 1200 hli)

Chamber Khoom

Muab ob npaug rau-phab ntsa SUS304 stainless hlau nrog cov dej helical sab hauv- cov kav dej txias

Arc Power Supplies

DC Arc Generators: 10A - 200A adjustable; Pulsed Arc xaiv muaj

Substrate Bias Power

-100V - -1000V adjustable pulsed bias fais fab mov (10kHz - 100kHz)

Cathode Sources

2 - 6 interchangeable magnetic -steering cathode chaw nres tsheb (dia. 85 hli lossis dia. 100 hli)

Substrate Rotation

3-axis planetary rotation tsav nrog kev tswj ceev ceev (0 - 10 rpm)

Tag Nrho Kev Txuas Hluav Taws Xob

45kVA - 120kVA (nyob ntawm qhov ntim thiab qhov chaw suav)

Kev xav tau dej txias

Tus nqi ntws: 15 - 40 m^3/h; Siab: 0.2 - 0.3 MPa; Temp: 18 - 25 deg C

 

Ntsiab nta


Sib nqus-Steering Cathode Technology:Kaw -loop magnetic fields cheb lub cathode qhov chaw thoob plaws lub hom phiaj nto, tsa lub hom phiaj siv tus nqi siab tshaj 55% thiab suppressing localized target cratering.


High Ionization Rate PlasmGenerates hlau ion ratios mus txog 80%, muab siab kinetic zog rau ntom zaj duab xis loj hlob thiab sib sib zog nqus metallurgical diffusion ntawm lub substrate interface.


Programmable Multi-Layer Deposition:Muaj PLC ua ke nrog HMI tswj architecture ua haujlwm automated sequencing ntawm reactive gases (N2, O2, C2H2) rau functional gradient thiab nanolayered txheej architectures.


Hauv -Situ Plasma Etching:Integrate hlau ion bombardment thiab unbalanced magnetron tu theem ua ntej deposition kom tshem tawm cov haiv neeg oxides thiab nto kab mob.

 

Nqus System Configuration


Lub tshuab nqus tsev subsystem yog engineered rau ceev ceev twj tso kua mis- down cycles thiab ruaj khov ua hauj lwm siab nyob rau hauv tas li reactive roj input:


Roughing & Roots Theem:Direct-tsav lub tshuab hluav taws xob los yog lub twj tso kua mis qhuav ua ke nrog lub hauv paus tshuab, tshem tawm lub chamber los ntawm huab cua siab mus rau 10 Pa hauv 5 feeb.


High Vacuum Stage:Sib nqus levitation turbomolecular twj tso kua mis xa high volumetric twj tso kua mis ceev rau dej vapor thiab residual gases, ruaj lub hauv paus siab lub hom phiaj hauv qab no 5.0 x 10^-4 Pa.


Valves & Gauging:Pneumatic lub rooj vag li qub thiab electro-pneumatic lub kaum sab xis li qub ua ke nrog tag nrho -Pirani / Penning ua ke ntsuas ntsuas rau kev sib cuam tshuam kev nyab xeeb.


Txoj Cai Siab:Kaw-loop capacitance manometer tawm tswv yim txuas nrog siab -precision mass flow controllers (MFCs) kom stabilize reactive gas ib nrab siab thaum lub sij hawm reactive deposition.

 

Evaporation Materials & Substrate Compatibility


Cov ntaub ntawv hom phiaj
Pure Hlau:Ti, Cr, Al, Zr, Cu, Mo, W, Nb.


Alloy Lub Hom Phiaj:TiAl (50/50, 33/67), TiSi, CrAl.


Cov pa roj carbon:Graphite lub hom phiaj rau pob zeb diamond -zoo li carbon (DLC) hybrid deposition.


Substrate Compatibility
Hardmetals / Cemented Carbides:WC-Co txiav inserts, kawg mills, thiab daim ntawv cov cuab yeej.


Siab -Speed ​​Steels (HSS):Tuav, twist xyaum, thiab broaches.


Engineering Steels:Stainless hlau, titanium alloys, thiab siab -kub nickel{1}}raws li superalloys.


Structure Ceramics:Alumina thiab silicon nitride Cheebtsam xav tau kev hloov kho tribological.

 

Daim ntawv thov


Txiav & Machining cuab yeej:Kev tso tawm ntawm TiAlN thiab AlCrN txheej txheej ntawm carbide inserts kom oxidation tsis kam mus txog 900 deg C thiab txuas lub cuab yeej lub neej thaum lub sij hawm siab - ceev qhuav txiav.


Automotive Cheebtsam:Cov txheej txheem nyuaj ntawm piston rings, valve lifters, thiab roj txhaj pins kom txo cov ciam teb sib txhuam coefficients qis dua 0.1 thiab tiv thaiv scuffing.


Moulds & Tuag:Daim ntawv thov ntawm CrN thiab TiCN zaj duab xis ntawm cov yas txhaj tshuaj pwm thiab hlau stamping tuag los tiv thaiv cov nplaum hnav thiab cov khoom siv galling.


Aerospace Hardware:Kev tiv thaiv kev yaig- tiv thaiv cov txheej txheem ntawm cov fasteners thiab compressor Cheebtsam ua haujlwm nyob rau hauv ib puag ncig corrosive.

 

Customization Options


Chamber Geometry:Vertical pit-style loading or horizontal front-loading door designs tailored to shop-pub layouts.


Hybrid Source Integration:Dual{0}}Technology configurations combining cathodic arc evaporators with unbalanced magnetron sputtering (UBMS) cathodes los yog linear ion guns.


Qib Automation:Factory integration xaiv xws li automated robotic loading caj npab los yog cleanroom partition phab ntsa mounting.


Lub zog Electronics:Customized pulsed bias generators optimized for insulating substrates or temperature -sensitive base material.

 

Kev Tswj Xyuas Zoo & Kev Xeem Lub Hoobkas


Leak Detection:Helium huab hwm coj spectrometer xau kuaj ua rau txhua lub tshuab nqus tsev thiab vuam seams, tswj tag nrho cov pa xau hauv qab 1.0 x 10^-9 Pa * m^3 / s.


Hluav taws xob Safety Audit:Rwb thaiv tsev tsis kam thiab grounding continuity xeem ua raws li CE thiab hluav taws xob cov qauv kev nyab xeeb.


Functional Dry Run:72-teev nruam automated qhuav voj voog xeem ntawm txhua yam kev sib hloov drives, valve sequencing, thiab txias dej ntws interlocks.


Kev Tshawb Fawb Txog Txheej Txheem (FAT):Optional deposition of reference TiN coatings on clients -muab daim coupons xeem daim coupon los xyuas cov zaj duab xis thickness uniformity, nano-hardness, thiab khawb adhesion zog ua ntej crating.

 

Installation & Technical Support


Phau Ntawv Qhia Kev Npaj Qhov Chaw:Cov ntaub ntawv qhia ntxaws txog kev tsim vaj tsev ua haujlwm npog hauv pem teb txwv tsis pub thauj khoom, tso pa tawm, cov dej txias txias, thiab cov khoom siv hluav taws xob tau muab 4 lub lis piam ua ntej xa khoom.


Ntawm -Site Commissioning:Field service engineers saib xyuas txhua qhov chaw, kev siv hluav taws xob sib txuas, lub tshuab nqus tsev sib khi, thiab kev sib txuas hluav taws xob.


Kev cob qhia txheej txheem:Ob txhais tes- ntawm kev cob qhia tus neeg teb xov tooj uas suav nrog kev saib xyuas chamber, kev hloov pauv lub hom phiaj, kev daws teeb meem lub tshuab nqus tsev, thiab kev tswj xyuas daim ntawv qhia.


Chaw Taws Teeb Diagnostics:Kev ruaj ntseg muaj VPN rooj vag kev koom ua ke rau hauv lub txee tswj rau tej thaj chaw deb software hloov tshiab, parameter logging tsom xam, thiab kev kuaj mob.

 

FAQ

 

Q: Yuav ua li cas lub kaw lus tswj macroparticle (droplet) tiam los ntawm cathodic arc evaporation?

A: Lub kaw lus suav nrog cov kauj tsheb sib nqus kom nrawm nrawm qhov chaw cathode thoob plaws lub hom phiaj saum npoo, txo qhov tsim ntawm macroparticle. Rau cov ntawv thov uas yuav tsum tau ultra- qhov chaw du (Ra < 0.05 um), macroparticle lim ducts (filtered cathodic arc) lossis hybrid magnetron sputtering configurations tuaj yeem ua ke.

Q: Lub hom phiaj kev siv lub hom phiaj yog dab tsi, thiab cov hom phiaj hloov li cas?

A: Siv cov khoom sib nqus- thev naus laus zis, kev siv lub hom phiaj ntawm 50% thiab 60%. Cathodes yog tsim los nrog ceev -clamp mechanisms, tso cai rau tus neeg teb xov tooj uas tau kawm tiav lub hom phiaj hloov thiab ntxuav cathode hauv 30 feeb ntawm ib qho chaw nres tsheb.

Q: Lub kaw lus puas tuaj yeem ua haujlwm ntau- txheej txheej lossis txheej txheej txheej txheej txheej?

A: Yes. The industrial PLC and HMI system store up to 100 recipe profiles. It automatically regulates gas mass flow controllers, arc current ramps, and bias voltage pulsing to deposit complex architectural layers (e.g., bonding layer -> gradient layer ->ua haujlwm nano-multilayer) yam tsis muaj kev cuam tshuam tus neeg teb xov tooj.

Q: Dab tsi yog qhov yuav tsum tau siv hluav taws xob rau tus qauv dia . 900 mm system?

A: Ib qho qauv dia. 900 mm unit yuav tsum muaj 3-theem 380V/480V (50/60Hz) fais fab mov nrog lub siab tshaj plaws load ntawm kwv yees li 75kVA, kaw-loop chilled dej mov (25 m^3/h ntawm 0.25 MPa), thiab ib tug huv, qhuav compressed cua valve (0.6 MPa actuation)

 

Cim npe nrov: Tuam Tshoj arc evaporation nyias zaj duab xis system, Tuam Tshoj arc evaporation nyias zaj duab xis system manufacturers, lwm tus neeg, Hoobkas

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